DNP Achieves Fine Pattern Resolution on EUV Lithography Photomasks for…

Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: 10⁻⁹ meter) generation[1] that support Extreme Ultra-Violet (EUV) lithog...